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トポロジカル絶縁体で世界最高性能の純スピン注入源を開発 次世代スピン軌道トルク磁気抵抗メモリの実現に期待
Showing live article 755 of 2008 in channel 24830269
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Language: Japanese
Channel Number: 24830269
Article Number: 755
Date: July 30, 2018, 5:35 pm
URL: https://www.titech.ac.jp/news/2018/041980.html
GUID: https://www.titech.ac.jp/news/2018/041980.html
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